SEMI P41 - Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on January 9, 2004. Initially available at www.semi.org February 2004; to be published March 2004.

E This standard was modified in September 2004 to correct editorial errors. Changes were made to Tables 2 and 3.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

This data structure specification uses the standard XML format for defect information communication between defect inspection tools, repair tools, and review tools at the mask production floor.

 

Mutual use of the defect information between the tools.

 

Optional usage by tools and systems other than defect inspection, repair, and review tools.

 

The equipment suppliers who utilize this standardized data structure can send and receive required information, with no dependence on specific software and specific hardware.

 

This standard can be applied to defect-related information on photomasks for semiconductor manufacturing.

 

This data structure defines the data hierarchy, the tag name, and contents of an XML file, which are transmitted. A particular database or a particular programming language is not specified in this standard.

 

Referenced SEMI Standards

None.

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