P04200 - SEMI P42 - Specification of Reticle Data for Automatic Recipe Transfer to Wafer Exposure System

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on January 9, 2004. Initially available at www.semi.org February 2004; to be published March 2004.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

This specification defines a common data interface, which consists of frame information of reticle data, in order to prepare recipes for wafer exposure tools. By utilizing this interface, it becomes possible to carry out data handling between design and wafer manufacture so that the data can be reused during recipe making of wafer exposure tools. This standard is intended to assist automatic recipe generation of wafer exposure tools.

 

This standard details frame information in automatic recipe preparation for wafer exposure equipment. This standard focuses on communication interface in work flow of design, mask manufacturing, and wafer manufacturing processes.

 

This standard defines the items of the required and common design information at a reticle design and a recipe preparation for wafer exposure equipment.

 

This standard defines a data interface, which can be commonly used independently to the suppliers and models of exposure equipment.

 

Referenced SEMI Standards

None.

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