P04500 - SEMI P45 - マスク装置向けジョブデック・データフォーマットの仕様

Volume(s): Microlithography
Language: Japanese
Type: Single Standards Download (.pdf)

本スタンダードは,global Micropatterning Committeeで技術的に承認されている。現版は2008513日,global Audits and Reviews Subcommitteeにて発行が承認された。20086月にwww.semi.orgで,そして20087月にCD-ROMで入手可能となる。初版は20063月に発行された。




Referenced SEMI Standards

SEMI P39 — OASISTM – Open Artwork System Interchange Standard
SEMI P44 — Specification for Open Artwork System Interchange Standard (OASISTM) Specific to Mask Tools

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