SEMI P46 - Specification for Critical Dimension (CD) Measurement Information Data on Photomask by XML

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract

This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 12, 2011. Available at www.semiviews.org and www.semi.org in November 2011; originally published July 2006.

 

NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use.

 

This Specification of XML data structure defines the common input/output information used for the critical dimension (CD) measurement tools for photomask.

 

The equipment supplier using this standardized data structure can perform transmission and reception, without being dependent on specific software and specific hardware.

 

This Standard can be applied to CD measurement on photomasks for semiconductor manufacturing.

 

This data structure defines data hierarchy, tag name, and contents for an XML file to be transmitted. A particular database or a particular programming language is not specified in this Standard.

 

Referenced SEMI Standards

SEMI P10 — Specification of Data Structures for Photomask Orders
SEMI P41 — Specification for Mask Defect Data Handling with XML, Between Defect Inspection Tools, Repair Tools, and Review Tools

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