P04600 - SEMI P46 - XMLによるフォトマスクのCD計測情報データの仕様

Volume(s): Microlithography
Language: Japanese
Type: Single Standards Download (.pdf)

本スタンダードは,global Micropatterning Committeeで技術的に承認されている。現版はglobal Audits and Reviews Subcommittee2006516日に発行が承認された。20066月にwww.semi.orgで, そして20067月にCD-ROMで入手可能となる。






Referenced SEMI Standards

SEMI P10 — Specification of Data Structures for Photomask Orders
SEMI P41 — Specification for Mask Defect Data Handling with Xml, Between Defect Inspection Tools, Repair Tools, and Review Tools

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