P04700 - SEMI P47 - ラインエッジラフネス(Line Edge Roughness)およびライン幅ラフネス(Line Width Roughness)測定の試験方法

Volume(s): Microlithography
Language: Japanese
Type: Single Standards Download (.pdf)

本スタンダードは,global Microlithography Committeeで技術的に承認されている。現版は20061121日,global Audits and Reviews Subcommitteeにて発行が承認された。20072月にwww.semi.orgで,そして20073月にCD-ROMで入手可能となる。




Referenced SEMI Standards

SEMI P19 — Specification for Metrology Pattern Cells for Integrated Circuit Manufacture
SEMI P35 — Terminology for Microlithography Metrology
SEMI P36 — Guideline of Magnification Reference for Critical Dimension Measurement Scanning Electron Microscopes

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