P04800 - SEMI P48 - Specification of Fiducial Marks for EUV Mask Blank

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
Abstract


This Standard specifies key requirements of fiducial marks that can be used as a coordinate system for referencing defect locations on extreme ultraviolet (EUV) blanks.


This Standard is intended to set an appropriate level of technical specifications of mask fiducial marks, such as their locations, shapes, sizes, line dimensions, and limits of variation. The marks must be readable by mask metrology and pattern write tools. This Standard is not intended to specify how to use the fiducial marks to locate defects on EUV blanks.

 

This Standard does not specify techniques to be used or how the fiducial marks are generated.

 

Referenced SEMI Standards (purchase separately)

SEMI P37 — Specification for Extreme Ultraviolet Lithography Substrates and Blanks

 

Revision History

SEMI P48-1110 (Reapproved 1221)

SEMI P48-1110 (Reapproved 0416)

SEMI P48-1110 (first published)

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