SEMI P48 - Specification of Fiducial Marks for EUV Mask Blank

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)

This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on March 16, 2016. Available at and in April 2016; originally published November 2010.


NOTICE: This Document was reapproved with minor editorial changes.


This Standard specifies key requirements of fiducial marks that can be used as a coordinate system for referencing defect locations on extreme ultraviolet (EUV) blanks.


This Standard is intended to set an appropriate level of technical specifications of mask fiducial marks, such as their locations, shapes, sizes, line dimensions, and limits of variation. The marks must be readable by mask metrology and pattern write tools. This Standard is not intended to specify how to use the fiducial marks to locate defects on EUV blanks.


This Standard does not specify techniques to be used or how the fiducial marks are generated.


Referenced SEMI Standards

SEMI E152 — Specification of EUV Pod for 150 mm EUVL Reticle
SEMI P1 — Specification for Hard Surface Photomask Substrates
SEMI P37 — Specification for Extreme Ultraviolet Lithography Substrates and Blanks

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