Plasma Etching, ALE, & RIE Course Manual

 Description: This manual discusses the fundamentals of plasma-assisted phenomena and reactive ion etching (RIE) processes, with an emphasis on the physical and chemical processes that determine the consequences of a reactive gas plasma/surface interaction. It also highlights the role of energetic ions as encountered in RIE systems, the factors that influence the anisotropy of etching, and plasma-assisted etching equipment.  

Target Audience:  Scientists, technicians, and others working with or interested in the dry etching of materials in reactive gas glow discharges, particularly those who do not have extensive experience in the field.   

Note: This manual is only available for purchase at SEMI Shows, like SEMICON West, ASMC, and SEMIExpo. Not available for online purchase.