PV06700 - SEMI PV67 - Test Method for the Etch Rate of a Crystalline Silicon Wafer by Determining the Weight Loss
The purpose of this Standard is to standardize a fast and accurate test method for the etch rate of a crystalline silicon wafer by determining the weight loss.
This Standard specifies the test method of crystalline silicon wafer etch, edge isolation etch, polishing and other corrosion rate.
This Standard applies to the testing of etch rate in the process of making cells.
This Standard specifies the corrosion time.
Referenced SEMI Standards (purchase separately)
SEMI PV67-0815 (Reapproved 0221)
SEMI PV67-0815 (first published)
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