PV06700 - SEMI PV67 - Test Method for the Etch Rate of a Crystalline Silicon Wafer by Determining the Weight Loss

Volume(s): Photovoltaic
Language: English
Type: Single Standards Download (.pdf)

The purpose of this Standard is to standardize a fast and accurate test method for the etch rate of a crystalline silicon wafer by determining the weight loss.

This Standard specifies the test method of crystalline silicon wafer etch, edge isolation etch, polishing and other corrosion rate.


This Standard applies to the testing of etch rate in the process of making cells.


This Standard specifies the corrosion time.


Referenced SEMI Standards (purchase separately)



Revision History

SEMI PV67-0815 (Reapproved 0221)

SEMI PV67-0815 (first published)

Related Products
Interested in purchasing additional SEMI Standards?

Consider SEMIViews, an online portal with access to over 1000 Standards.

Refund Policy: Due to the nature of our products, SEMI has a no refund/no exchange policy. Please make sure that you have reviewed your order prior to finalizing your purchase. All sales are final.

Member Price: $113.00
Regular price Non-Member Price: $150.00