SEMI PV81 - Guide for Specifying Low Pressure Horizontal Diffusion Furnace -

Abstract

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1  Purpose
1.1  Compared with atmospheric horizontal diffusion furnace, low pressure horizontal diffusion technology has advantages of higher volume production, lower space requirement, less energy consumption and better sheet resistance uniformity, but all of these advantages are based on several key parameters of equipment. This Guide is provided as a reference for diffusion furnace equipment manufacturers and customers, so that low pressure horizontal diffusion can achieve less cost and higher performance.
2  Scope
2.1  Low pressure horizontal diffusion furnace described in this Guide is mainly used for building p-n junction under low pressure condition in the silicon solar cells diffusion production line.
2.2  This Guide analyzes several key parameters which influence the diffusion process results in low pressure. These parameters which are verified by series of experiments and tests on the production lines are valuable references for horizontal diffusion furnace equipment manufacturers.
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Referenced SEMI Standards (purchase separately)
None.
NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions.

Revision History
SEMI PV81-1125 (technical revision)
SEMI PV81-0318 (first published)

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