SEMI PV91 - Specification for Trichlorosilane Used in Polysilicon Production -
Abstract
The
purpose of this Document is to provide specifications for different grades of
trichlorosilane that are used in
polysilicon industry.
With
the growth of the photovoltaic market, the customers demand for quality of
polysilicon is extremely high. Trichlorosilane is one of the critical raw materials of polysilicon production.
The
impurity content in trichlorosilane may directly impact the quality of
polysilicon. The standard for trichlorosilane is to
guide the production plants to obtain higher quality materials.
This Document covers the requirements for all grades of trichlorosilane
used in the polysilicon production industry.
If
analytical methods are incomplete, the requirements are presented as a
guideline.
Referenced SEMI Standards
SEMI C10 ––
Guide for Determination of Method Detection Limits
SEMI C28 –– Specification
and Guide for Hydrofluoric Acid
SEMI C35 ––
Specification and Guide for Nitric Acid
SEMI MF1630 –– Test
Method for Low Temperature FT-IR Analysis of Single Crystal Silicon for III-V Impurities
SEMI MF1723 –– Practice
for Evaluation of Polycrystalline Silicon Rods by Float-Zone Crystal Growth and
Spectroscopy
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