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Semiconductor Characterization Techniques and Applications
Description
Semiconductor Characterization Techniques and Applications introduces the core techniques used to characterize semiconductor materials and devices. Learners build practical knowledge of how electrical, optical, and structural measurements are used in device development and production.
Topics include I-V (Current-Voltage) and C-V (Capacitance-Voltage) analysis, thin film measurements, electron and ion beam imaging, and spectroscopy methods used to assess material composition and quality. The included courses emphasize real-world applications, showing how test data is used to evaluate performance, identify defects, and support process control in CMOS (Complementary Metal Oxide Semiconductor) and related technologies.
This series is designed for engineers and technical professionals who need a solid understanding of how characterization tools are applied in semiconductor workflows.
Upon successful completion, learners will earn a certificate of completion from Arizona State University.
Curriculum Duration
21 hours
What you’ll learn
By the end of this series, learners will be able to:
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Interpret electrical measurements to assess the performance of diodes, MOS capacitors, & MOSFETs (Metal-Oxide Semiconductor Field-Effect Transistors)
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Analyze thin film properties using optical techniques such as ellipsometry and reflectance spectroscopy
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Identify material composition and surface characteristics using SEM (Scanning Electron Microscopy), SIMS (Secondary Ion Mass Spectrometry), and AES (Auger Electron Spectroscopy)
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Evaluate photoluminescence and X-ray data to determine crystalline quality and elemental makeup
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Use characterization data to diagnose device issues and inform semiconductor process decisions
Skills you’ll gain
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Electrical test interpretation I-V (Current-Voltage) and C-V (Capacitance-Voltage) resistance
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Thin film and surface analysis
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SEM (Scanning Electron Microscopy), SIMS (Secondary Ion Mass), and AES (Auger Electron Spectroscopy) fundamentals
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Ellipsometry and reflectance spectroscopy
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Photoluminescence and X-ray spectroscopy
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Device parameter extraction and process diagnostics
Target audience
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Engineers working in semiconductor process development, yield engineering, or testing
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Technicians and analysts who support device characterization or metrology
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R&D professionals transitioning into semiconductor-focused roles
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STEM graduates seeking applied knowledge of industry-standard measurement techniques
No prior experience with characterization tools is required, but a basic understanding of semiconductor devices is recommended.
Courses and Descriptions
Fundamentals of Semiconductor Characterization - Reviews semiconductor physics and introduces basic characterization concepts used to evaluate electrical behavior in devices like diodes and MOS capacitors.
Electrical Characterization: Diodes - Covers techniques for measuring resistance, contact behavior, and I-V characteristics in diodes, with a focus on parameter extraction and test setup.
Electrical Characterization: MOSFETs - Teaches how to analyze MOSFET (Metal-Oxide Semiconductor Field-Effect Transistor) behavior using C-V and I-V data, including threshold voltage extraction and oxide charge assessment.
Electron and Ion Beam Characterization - Introduces scanning electron microscopy, Auger spectroscopy, and SIMS for analyzing surface structure, composition, and dopant profiles.
Optical and X-Ray Characterization - Explains how to use ellipsometry, reflectance, photoluminescence, and X-ray spectroscopy to measure thin film properties and identify material features.
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