SEMI T11 - Specification for Marking of Hard Surface Reticle Substrates
This Standard was technically approved by the Traceability Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on August 25, 2014. Available at www.semiviews.org and www.semi.org in October 2014; originally published November 2002; previously published July 2009.
This Specification provides a symbology for marking hard surface reticle substrates within the edge exclusion area of the substrate.
This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two-dimensional, machine-readable, Data Matrix symbols for pattern-surface marking of resist-coated 6 inch reticle substrates that comply with the specifications of SEMI P1.
This Specification addresses only the Data Matrix field characteristics and location. This Data Matrix field may contain the information previously contained in various bar code symbols on 6 inch reticles. The format of such information is not detailed in this Specification.
Referenced SEMI Standards
SEMI P1 — Specification for Hard Surface Photomask Substrates
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