SEMI T11 - Specification for Marking of Hard Surface Reticle Substrates -

Abstract

This Specification provides a symbology for marking hard surface reticle substrates within the edge exclusion area of the substrate.

This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two-dimensional, machine-readable, Data Matrix symbols for pattern-surface marking of resist-coated 6 inch reticle substrates that comply with the specifications of SEMI P1.

 

This Specification addresses only the Data Matrix field characteristics and location. This Data Matrix field may contain the information previously contained in various bar code symbols on 6 inch reticles. The format of such information is not detailed in this Specification.

 

Referenced SEMI Standards (purchase separately)

SEMI P1 — Specification for Hard Surface Photomask Substrates

 

Revision History

SEMI T11-0703 (Reapproved 0921)

SEMI T11-0703 (Reapproved 1014)

SEMI T11-0703 (Reapproved 0709)

SEMI T11-0703 (technical revision)

SEMI T11-1102 (first published)

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