SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks -

Abstract

This Specification provides a symbology for marking hard surface extreme ultraviolet (EUV) masks.

This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two-dimensional, machine-readable, Data Matrix symbols for pattern-surface marking of resist-coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38.

 

This Specification addresses only the Data Matrix field characteristics and location. This Data Matrix field may contain the information previously contained in various bar code symbols on 6 inch optical reticles. The format of such information is not detailed in this Specification.

 

Referenced SEMI Standards (purchase separately)

SEMI P37 — Specification for Extreme Ultraviolet Lithography Substrates and Blanks

SEMI P38 — Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks (Withdrawn 0710)

 

Revision History

SEMI T16-0310 (Reapproved 0322)

SEMI T16-0310 (Reapproved 0216)

SEMI T16-0310 (technical revision)

SEMI T16-0706 (technical revision)

SEMI T16-1105 (first published)

Refund Policy: Due to the nature of our products, SEMI has a no refund/no exchange policy. Please make sure that you have reviewed your order prior to finalizing your purchase. All sales are final.