SEMI T16 - Specification for Use of Data Matrix Symbology for Automated Identification of Extreme Ultraviolet Lithography Masks
This Standard was technically approved by the Traceability Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 4, 2015. Available at www.semiviews.org and www.semi.org in February 2016; originally published November 2005; previously published March 2010.
This Specification provides a symbology for marking hard surface extreme ultraviolet (EUV) masks.
This Specification defines the geometric and spatial relationships and content (including error checking and correcting code) of square two-dimensional, machine-readable, Data Matrix symbols for pattern-surface marking of resist-coated 6 inch EUV masks that comply with, or extrapolate from, the specifications of SEMI P37 and SEMI P38.
This Specification addresses only the Data Matrix field characteristics and location. This Data Matrix field may contain the information previously contained in various bar code symbols on 6 inch optical reticles. The format of such information is not detailed in this Specification.
Referenced SEMI Standards
SEMI P37 — Specification for Extreme Ultraviolet Lithography Substrates and Blanks
SEMI P38 — Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks (Withdrawn 0710)