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MF172600 - SEMI MF1726 - Practice for Analysis of Crystallographic Perfection of Silicon Wafers
SEMI MF1726 - Practice for Analysis of Crystallographic Perfection of Silicon Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
MF161900 - SEMI MF1619 - Test Method for Measurement of Interstitial Oxygen Content of Silicon Wafers by Infrared Absorption Spectroscopy with p-Polarized Radiation Incident at the Brewster Angle
MF156900 - SEMI MF1569 - Guide for Generation of Consensus Reference Materials for Semiconductor Technology
MF152700 - SEMI MF1527 - Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon
MF145100 - SEMI MF1451 - Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning
MF138800 - SEMI MF1388 - Test Method for Generation Lifetime and Generation Velocity of Silicon Material by Capacitance-Time Measurements of Metal-Oxide-Silicon (MOS) Capacitors
MF104900 - SEMI MF1049 - Practice for Shallow Etch Pit Detection on Silicon Wafers
SEMI MF1049 - Practice for Shallow Etch Pit Detection on Silicon Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
ME139200 - SEMI ME1392 - Guide for Angle Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces
M08800 - SEMI M88 - Practice for Sample Preparation Methods for Measuring Minority Carrier Diffusion Length in Silicon Wafers by Surface Photovoltage Methods
M08400 - SEMI M84 - Specification for Polished Single Crystal Silicon Wafers for Gallium Nitride-On-Silicon Applications
M08200 - SEMI M82 - Test Method for the Carbon Acceptor Concentration in Semi-Insulating Gallium Arsenide Single Crystals by Infrared Absorption Spectroscopy
M08000 - SEMI M80 - Specification for Front-Opening Shipping Box Used to Transport and Ship 450 mm Wafers
M07900 - SEMI M79 - Specification for Round 100 mm Polished Monocrystalline Germanium Wafers for Solar Cell Applications
M07700 - SEMI M77 - ロールオフ量(ROA)を使ってウェーハのエッジ近傍形状を決定するための作業方法
M07700 - SEMI M77 - Test Method for Determining Wafer Near-Edge Geometry Using Roll-Off Amount, ROA
M07500 - SEMI M75 - Specification for Polished Monocrystalline Gallium Antimonide Wafers
SEMI M75 - Specification for Polished Monocrystalline Gallium Antimonide Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M07400 - SEMI M74 - Specification for 450 mm Diameter Mechanical Handling Polished Wafers
SEMI M74 - Specification for 450 mm Diameter Mechanical Handling Polished Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M07100 - SEMI M71 - CMOS LSI用シリコン・オン・インシュレーター(SOI)ウェーハのための仕様
M07000 - SEMI M70 - パーシャルサイト平坦度を使ってウェーハのエッジ近傍形状を決定するための作業方法
M07000 - SEMI M70 - Test Method for Determining Wafer-Near-Edge Geometry Using Partial Wafer Site Flatness
M06600 - SEMI M66 - Test Method to Extract Effective Work Function in Oxide and High-K Gate Stacks Using the MIS Flat Band Voltage-Insulator Thickness Technique
M06600 - SEMI M66 - MISフラットバンド電圧―絶縁膜厚法を使った,酸化膜,およびhigh-κゲートスタックの有効仕事関数の算出方法
M06500 - SEMI M65 - Specification for Sapphire Substrates to use for Compound Semiconductor Epitaxial Wafers
M06500 - SEMI M65 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様