SEMI Standards

SEMI International Standards form the foundation for innovation in the microelectronics industry. The SEMI Standards process has been used to create more than 1,000 industry approved Standards and Safety Guidelines, based on the work of more than 5,000 volunteers in key topics including safety, materials, packaging, traceability and cybersecurity. For 50 years, SEMI Standards have helped reduce manufacturing complexity, which enables customer cost reduction, improved supplier quality, and shorter time-to-market. Each year, more than 1,000 companies purchase and use SEMI Standards to improve manufacturing operations.

Individual SEMI Standards

Individual SEMI Standards are available for immediate download. You may view the abstract of the Standard before purchasing. Downloadable Standards are priced at $180 USD and $355 USD each; SEMI Members receive a 25% discount. SEMI Standards currently use PDF file format, which requires Adobe Acrobat Reader for viewing. Search for Standards by using the Search form at the top of the page or browse Current Standards by Volume, Topic, Language and Publishing Cycle below.

M06500 - SEMI M65 - Specification for Sapphire Substrates to use for Compound Semiconductor Epitaxial Wafers
M06500 - SEMI M65 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様
M06600 - SEMI M66 - MISフラットバンド電圧―絶縁膜厚法を使った,酸化膜,およびhigh-κゲートスタックの有効仕事関数の算出方法
M06600 - SEMI M66 - Test Method to Extract Effective Work Function in Oxide and High-K Gate Stacks Using the MIS Flat Band Voltage-Insulator Thickness Technique
M06700 - SEMI M67 - Test Method for Determining Wafer Near-Edge Geometry from a Measured Thickness Data Array Using the ESFQR, ESFQD, and ESBIR Metrics
M06700 - SEMI M67 - 測定した厚さデータ配列からESFQR,ESFQD,ESBIR METRICS法を使ってウェーハのエッジ近傍形状を決定するための作業方法
M06800 - SEMI M68 - Test Method for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD
M06800 - SEMI M68 - 測定した高さデータ配列から曲率法ZDDを使ってウェーハのエッジ近傍形状を決定するための作業方法
M07000 - SEMI M70 - Test Method for Determining Wafer-Near-Edge Geometry Using Partial Wafer Site Flatness
M07000 - SEMI M70 - パーシャルサイト平坦度を使ってウェーハのエッジ近傍形状を決定するための作業方法
M07100 - SEMI M71 - CMOS LSI用シリコン・オン・インシュレーター(SOI)ウェーハのための仕様
M07100 - SEMI M71 - Specification for Silicon-on-Insulator (SOI) Wafers for CMOS LSI
SEMI M71 - Specification for Silicon-on-Insulator (SOI) Wafers for CMOS LSI Sale priceMember Price: $144.00
Non-Member Price: $187.00
M07300 - SEMI M73 - Test Method for Extracting Relevant Characteristics from Measured Wafer Edge Profiles
M07300 - SEMI M73 - 測定したウェーハエッジプロファイルから直接的関連性ある特性を抽出するテスト方法
M07400 - SEMI M74 - Specification for 450 mm Diameter Mechanical Handling Polished Wafers
SEMI M74 - Specification for 450 mm Diameter Mechanical Handling Polished Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
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SEMIViews

Easy Web Access to SEMI International Standards and Safety Guidelines. SEMIViews is an annual subscription-based product for online access to SEMI Standards. SEMIViews allows password-protected access to over 1,000 Standards at your convenience. Learn More