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1843 products

C08900 - SEMI C89 - Test Method for Particle Removal Performance of Liquid Filter Rated Below 30 nm with Inductively Coupled Plasma – Mass Spectroscopy (ICP-MS)
C09000 - SEMI C90 - Specification for Perfluoroalkoxy Alkane (PFA) and Other Fluorinated Materials Used In Liquid Chemical Distribution Systems
C09100 - SEMI C91 - Test Method for Determination of Moisture Dry-Down Characteristics of Gas Delivery Components
C09200 - SEMI C92 - Test Method for Determining the Critical Pitting Temperature of Stainless Steel Surfaces Used in Corrosive Gas Systems by Use of a Ferric Chloride Solution
C09300 - SEMI C93 - Guide for Determining the Quality of Ion Exchange Resin Used in Polish Applications of Ultrapure Water System
C09400 - SEMI C94 - Guide for Cyclohexanone
SEMI C94 - Guide for Cyclohexanone Sale priceMember Price: $148.00
Non-Member Price: $193.00
C09500 - SEMI C95 - Guide for Pentakis Dimethylamino Tantalum
SEMI C95 - Guide for Pentakis Dimethylamino Tantalum Sale priceMember Price: $148.00
Non-Member Price: $193.00
C09600 - SEMI C96 - Test Method for Determining Density of Chemical Mechanical Planarization (CMP) Slurries
C09700 - SEMI C97 - Specification for Determination of Particle Levels of Gases Delivered as Pipeline Gas or by Pressurized Gas Cylinder
C09800 - SEMI C98 - Guide for Chemical Mechanical Planarization (CMP) Particle Size Distribution (PSD) Measurement and Reporting Used in Semiconductor Manufacturing
C09900 - SEMI C99 - Test Method for Determining Conductivity of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals
C10000 - SEMI C100 - Guide for Reporting Chemical Mechanical Planarization (CMP) Polishing Pads Hardness Used in Semiconductor Manufacturing
C10100 - SEMI C101 - Test Method for Determining pH of Chemical Mechanical Planarization (CMP) Slurries and Related Chemicals
C10200 - SEMI C102 - Guide for Reporting Density and Porosity of Chemical Mechanical Planarization (CMP) Polishing Pads Used in Semiconductor Manufacturing
C10300 - SEMI C103 - Guide for Reporting Performance Parameters of the Chemical Mechanical Planarization (CMP) Conditioning Disks Used in Semiconductor Manufacturing
C10400 - SEMI C104 - Guide for Reporting Performance Parameters of the Polymer Windows for Chemical Mechanical Planarization (CMP) Pads Used in Semiconductor Manufacturing
C10500 - SEMI C105 - Guide for Trace Iron Analysis in High Purity 2-Propanol (IPA)
SEMI C105 - Guide for Trace Iron Analysis in High Purity 2-Propanol (IPA) Sale priceMember Price: $148.00
Non-Member Price: $193.00
Certified Sustainable Supply Chain Professional (CSSCP)
Certified Sustainable Supply Chain Professional (CSSCP) Sale priceMember Price: $1,390.00
Non-Member Price: $1,490.00
Circularity Strategies and Waste Regulations
Circularity Strategies and Waste Regulations Sale priceMember Price: $249.00
Non-Member Price: $299.00
Climate FRESK Workshop
Climate FRESK Workshop Sale priceMember Price: $1,200.00
Non-Member Price: $5,000.00
CMP Technologies and Markets
CMP Technologies and Markets Sale priceMember Price: $16,000.00
Non-Member Price: $16,000.00
Conductor Annual Subscription
Conductor Annual Subscription Sale priceMember Price: $12,000.00
Non-Member Price: $12,000.00
Creative Computing Introduction to Scratch Programming
Creative Computing Introduction to Scratch Programming Sale priceMember Price: $19.00
Non-Member Price: $24.00
D00300 - SEMI D3 - FPD基板の有効範囲の仕様
SEMI D3 - FPD基板の有効範囲の仕様 Sale priceMember Price: $176.00
Non-Member Price: $231.00