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MF176300 - SEMI MF1763 - Test Method for Measuring Contrast of a Linear Polarizer
SEMI MF1763 - Test Method for Measuring Contrast of a Linear Polarizer Sale priceMember Price: $144.00
Non-Member Price: $187.00
MF172600 - SEMI MF1726 - Practice for Analysis of Crystallographic Perfection of Silicon Wafers
SEMI MF1726 - Practice for Analysis of Crystallographic Perfection of Silicon Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
MF161900 - SEMI MF1619 - Test Method for Measurement of Interstitial Oxygen Content of Silicon Wafers by Infrared Absorption Spectroscopy with p-Polarized Radiation Incident at the Brewster Angle
SEMI MF1619 - Test Method for Measurement of Interstitial Oxygen Content of Silicon Wafers by Infrared Absorption Spectroscopy with p-Polarized Radiation Incident at the Brewster Angle Sale priceMember Price: $144.00
Non-Member Price: $187.00
MF156900 - SEMI MF1569 - Guide for Generation of Consensus Reference Materials for Semiconductor Technology
SEMI MF1569 - Guide for Generation of Consensus Reference Materials for Semiconductor Technology Sale priceMember Price: $144.00
Non-Member Price: $187.00
MF152700 - SEMI MF1527 - Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon
SEMI MF1527 - Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon Sale priceMember Price: $144.00
Non-Member Price: $187.00
MF145100 - SEMI MF1451 - Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning
SEMI MF1451 - Test Method for Measuring Sori on Silicon Wafers by Automated Noncontact Scanning Sale priceMember Price: $144.00
Non-Member Price: $187.00
MF138800 - SEMI MF1388 - Test Method for Generation Lifetime and Generation Velocity of Silicon Material by Capacitance-Time Measurements of Metal-Oxide-Silicon (MOS) Capacitors
SEMI MF1388 - Test Method for Generation Lifetime and Generation Velocity of Silicon Material by Capacitance-Time Measurements of Metal-Oxide-Silicon (MOS) Capacitors Sale priceMember Price: $144.00
Non-Member Price: $187.00
MF104900 - SEMI MF1049 - Practice for Shallow Etch Pit Detection on Silicon Wafers
SEMI MF1049 - Practice for Shallow Etch Pit Detection on Silicon Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
ME139200 - SEMI ME1392 - Guide for Angle Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces
SEMI ME1392 - Guide for Angle Resolved Optical Scatter Measurements on Specular or Diffuse Surfaces Sale priceMember Price: $144.00
Non-Member Price: $187.00
M08800 - SEMI M88 - Practice for Sample Preparation Methods for Measuring Minority Carrier Diffusion Length in Silicon Wafers by Surface Photovoltage Methods
SEMI M88 - Practice for Sample Preparation Methods for Measuring Minority Carrier Diffusion Length in Silicon Wafers by Surface Photovoltage Methods Sale priceMember Price: $144.00
Non-Member Price: $187.00
M08400 - SEMI M84 - Specification for Polished Single Crystal Silicon Wafers for Gallium Nitride-On-Silicon Applications
SEMI M84 - Specification for Polished Single Crystal Silicon Wafers for Gallium Nitride-On-Silicon Applications Sale priceMember Price: $144.00
Non-Member Price: $187.00
M08200 - SEMI M82 - Test Method for the Carbon Acceptor Concentration in Semi-Insulating Gallium Arsenide Single Crystals by Infrared Absorption Spectroscopy
SEMI M82 - Test Method for the Carbon Acceptor Concentration in Semi-Insulating Gallium Arsenide Single Crystals by Infrared Absorption Spectroscopy Sale priceMember Price: $144.00
Non-Member Price: $187.00
M07900 - SEMI M79 - Specification for Round 100 mm Polished Monocrystalline Germanium Wafers for Solar Cell Applications
SEMI M79 - Specification for Round 100 mm Polished Monocrystalline Germanium Wafers for Solar Cell Applications Sale priceMember Price: $144.00
Non-Member Price: $187.00
M06600 - SEMI M66 - Test Method to Extract Effective Work Function in Oxide and High-K Gate Stacks Using the MIS Flat Band Voltage-Insulator Thickness Technique
SEMI M66 - Test Method to Extract Effective Work Function in Oxide and High-K Gate Stacks Using the MIS Flat Band Voltage-Insulator Thickness Technique Sale priceMember Price: $144.00
Non-Member Price: $187.00
M06300 - SEMI M63 - Test Method for Measuring the Al Fraction in AlGaAs on GaAs Substrates by High Resolution X-Ray Diffraction
SEMI M63 - Test Method for Measuring the Al Fraction in AlGaAs on GaAs Substrates by High Resolution X-Ray Diffraction Sale priceMember Price: $144.00
Non-Member Price: $187.00
M00600 - SEMI M6 - 太陽光電池用シリコンウェーハの仕様
SEMI M6 - 太陽光電池用シリコンウェーハの仕様 Sale priceMember Price: $171.00
Non-Member Price: $180.00
M06100 - SEMI M61 - Specification for Silicon Epitaxial Wafers with Buried Layers
SEMI M61 - Specification for Silicon Epitaxial Wafers with Buried Layers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M06000 - SEMI M60 - Test Method for Time Dependent Dielectric Breakdown Characteristics of SiO2 Films for Si Wafer Evaluation
SEMI M60 - Test Method for Time Dependent Dielectric Breakdown Characteristics of SiO2 Films for Si Wafer Evaluation Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05800 - SEMI M58 - Test Method for Evaluating DMA Based Particle Deposition Systems and Processes
SEMI M58 - Test Method for Evaluating DMA Based Particle Deposition Systems and Processes Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05700 - SEMI M57 - Specification for Silicon Annealed Wafers
SEMI M57 - Specification for Silicon Annealed Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05600 - SEMI M56 - Practice for Determining Cost Components for Metrology Equipment Due to Measurement Variability and Bias
SEMI M56 - Practice for Determining Cost Components for Metrology Equipment Due to Measurement Variability and Bias Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05200 - SEMI M52 - Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations
SEMI M52 - Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations Sale price Member Price : $144.00
M05100 - SEMI M51 - Test Method for Characterizing Silicon Wafer by Gate Oxide Integrity
SEMI M51 - Test Method for Characterizing Silicon Wafer by Gate Oxide Integrity Sale priceMember Price: $144.00
Non-Member Price: $187.00
M04900 - SEMI M49 - Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 16 nm Technology Generations
SEMI M49 - Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 16 nm Technology Generations Sale priceMember Price: $144.00
Non-Member Price: $187.00