Products

Filters

Price
to
Sort by:

1891 products

M05500 - SEMI M55 - Specification for Polished Monocrystalline Silicon Carbide Wafers
SEMI M55 - Specification for Polished Monocrystalline Silicon Carbide Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05500 - SEMI M55 - 鏡面単結晶シリコンカーバイドウェーハの仕様
SEMI M55 - 鏡面単結晶シリコンカーバイドウェーハの仕様 Sale priceMember Price: $171.00
Non-Member Price: $224.00
M05600 - SEMI M56 - Practice for Determining Cost Components for Metrology Equipment Due to Measurement Variability and Bias
M05600 - SEMI M56 - 計量装置の測定変動と偏りに起因する費用成分の作業法
SEMI M56 - 計量装置の測定変動と偏りに起因する費用成分の作業法 Sale priceMember Price: $171.00
Non-Member Price: $224.00
M05700 - SEMI M57 - Specification for Silicon Annealed Wafers
SEMI M57 - Specification for Silicon Annealed Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05700 - SEMI M57 - シリコンアニールウェーハの仕様
SEMI M57 - シリコンアニールウェーハの仕様 Sale priceMember Price: $171.00
Non-Member Price: $224.00
M05800 - SEMI M58 - DMAを基にしたパーティクル堆積システムとプロセス評価のためのテスト方法
M05800 - SEMI M58 - Test Method for Evaluating DMA Based Particle Deposition Systems and Processes
M05900 - SEMI M59 - Terminology for Silicon Technology
SEMI M59 - Terminology for Silicon Technology Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05900 - SEMI M59 - シリコン技術の用語集
SEMI M59 - シリコン技術の用語集 Sale priceMember Price: $171.00
Non-Member Price: $224.00
M06000 - SEMI M60 - Test Method for Time Dependent Dielectric Breakdown Characteristics of SiO2 Films for Si Wafer Evaluation
M06000 - SEMI M60 - シリコンウェーハ評価のためのSiO2の経時絶縁破壊特性の試験方法
M06100 - SEMI M61 - Specification for Silicon Epitaxial Wafers with Buried Layers
SEMI M61 - Specification for Silicon Epitaxial Wafers with Buried Layers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M06100 - SEMI M61 - 埋め込み層付きシリコンエピタキシャルウェーハの仕様
SEMI M61 - 埋め込み層付きシリコンエピタキシャルウェーハの仕様 Sale priceMember Price: $171.00
Non-Member Price: $224.00
M06200 - SEMI M62 - Specification for Silicon Epitaxial Wafers
SEMI M62 - Specification for Silicon Epitaxial Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M06200 - SEMI M62 - シリコンエピタキシャルウェーハの仕様
SEMI M62 - シリコンエピタキシャルウェーハの仕様 Sale priceMember Price: $171.00
Non-Member Price: $224.00
M06300 - SEMI M63 - Test Method for Measuring the Al Fraction in AlGaAs on GaAs Substrates by High Resolution X-Ray Diffraction
M06300 - SEMI M63 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様
M06400 - SEMI M64 - Test Method for the EL2 Deep Donor Concentration in Semi-Insulating (SI) Gallium Arsenide Single Crystals by Infrared Absorption Spectroscopy
M06400 - SEMI M64 - 赤外線吸収スペクトル法による絶縁(SI)ガリウムヒ素単結晶内のEL2深いドナー濃度の試験方法
M06500 - SEMI M65 - Specification for Sapphire Substrates to use for Compound Semiconductor Epitaxial Wafers
M06500 - SEMI M65 - 化合物半導体エピタキシャルウェーハに使用するサファイア基板の仕様
M06600 - SEMI M66 - MISフラットバンド電圧―絶縁膜厚法を使った,酸化膜,およびhigh-κゲートスタックの有効仕事関数の算出方法
M06600 - SEMI M66 - Test Method to Extract Effective Work Function in Oxide and High-K Gate Stacks Using the MIS Flat Band Voltage-Insulator Thickness Technique