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M06000 - SEMI M60 - Test Method for Time Dependent Dielectric Breakdown Characteristics of SiO2 Films for Si Wafer Evaluation
M06000 - SEMI M60 - シリコンウェーハ評価のためのSiO2の経時絶縁破壊特性の試験方法
M05900 - SEMI M59 - Terminology for Silicon Technology
SEMI M59 - Terminology for Silicon Technology Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05900 - SEMI M59 - シリコン技術の用語集
SEMI M59 - シリコン技術の用語集 Sale priceMember Price: $171.00
Non-Member Price: $224.00
M05800 - SEMI M58 - Test Method for Evaluating DMA Based Particle Deposition Systems and Processes
M05800 - SEMI M58 - DMAを基にしたパーティクル堆積システムとプロセス評価のためのテスト方法
M05700 - SEMI M57 - Specification for Silicon Annealed Wafers
SEMI M57 - Specification for Silicon Annealed Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05600 - SEMI M56 - Practice for Determining Cost Components for Metrology Equipment Due to Measurement Variability and Bias
M05500 - SEMI M55 - Specification for Polished Monocrystalline Silicon Carbide Wafers
SEMI M55 - Specification for Polished Monocrystalline Silicon Carbide Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05400 - SEMI M54 - Guide for Semi-Insulating (SI) GaAs Material Parameters
SEMI M54 - Guide for Semi-Insulating (SI) GaAs Material Parameters Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05400 - SEMI M54 - 半絶縁性(SI)GaAs材料のパラメータのガイド
SEMI M54 - 半絶縁性(SI)GaAs材料のパラメータのガイド Sale priceMember Price: $171.00
Non-Member Price: $224.00
M05300 - SEMI M53 - Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodispere Reference Spheres on Unpatterned Semiconductor Wafer Surfaces
M05200 - SEMI M52 - Guide for Specifying Scanning Surface Inspection Systems for Silicon Wafers for the 130 nm to 5 nm Technology Generations
M05100 - SEMI M51 - Test Method for Characterizing Silicon Wafer by Gate Oxide Integrity
SEMI M51 - Test Method for Characterizing Silicon Wafer by Gate Oxide Integrity Sale priceMember Price: $144.00
Non-Member Price: $187.00
M05000 - SEMI M50 - Test Method for Determining Capture Rate and False Count Rate for Surface Scanning Inspection Systems by the Overlay Method
M04900 - SEMI M49 - Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 16 nm Technology Generations
M04600 - SEMI M46 - Test Method for Measuring Carrier Concentrations in Epitaxial Layer Structures by ECV Profiling
M04600 - SEMI M46 - ECV法によりエピタキシァル層内のキャリア密度プロファイルを測定するための試験方法
M04500 - SEMI M45 - Specification for 300 mm Wafer Shipping System
SEMI M45 - Specification for 300 mm Wafer Shipping System Sale priceMember Price: $144.00
Non-Member Price: $187.00
M04400 - SEMI M44 - Guide to Conversion Factors for Interstitial Oxygen in Silicon
SEMI M44 - Guide to Conversion Factors for Interstitial Oxygen in Silicon Sale priceMember Price: $144.00
Non-Member Price: $187.00
M04400 - SEMI M44 - シリコン中の酸素の換算係数ガイド
SEMI M44 - シリコン中の酸素の換算係数ガイド Sale priceMember Price: $171.00
Non-Member Price: $224.00
M04300 - SEMI M43 - Guide for Reporting Wafer Nanotopography
SEMI M43 - Guide for Reporting Wafer Nanotopography Sale priceMember Price: $144.00
Non-Member Price: $187.00
M04200 - SEMI M42 - Specification for Compound Semiconductor Epitaxial Wafers
SEMI M42 - Specification for Compound Semiconductor Epitaxial Wafers Sale priceMember Price: $144.00
Non-Member Price: $187.00
M04200 - SEMI M42 - 化合物半導体エピタキシャルウェーハの仕様
SEMI M42 - 化合物半導体エピタキシャルウェーハの仕様 Sale priceMember Price: $171.00
Non-Member Price: $224.00